Si薄膜,silicon films
1)silicon filmsSi薄膜
1.Thesilicon films under different substrate conditions and silane concentrations by the self-designed ICP-CVD equipment were deposited.采用自主设计的ICP-CVD设备,在不同的衬底条件和SiH4浓度下制备了一系列的Si薄膜样品。
2.Thesilicon films have been deposited by ion beam sputtering on the Si(100) wafer at 400℃.在温度为400℃下,采用离子束溅射技术在 Si(100)衬底上沉积Si薄膜。
英文短句/例句
1.Research of Poly-Si Films Deposited by ECR-PECVD at Low-temperature;ECR-PECVD法低温沉积Poly-Si薄膜的研究
2.The Performance Research of Fe-Co Co-doped Si Flim对Fe-Co共掺Si薄膜的性能研究
3.Low-temperature Growth and Its Characteristic Research of Poly-silicon Thin Films Deposited by ECR-PECVD;低温下Poly-Si薄膜的ECR-PECVD生长及特性研究
4.Influence of Substrate-to-target Distance on the Properties of nc-Si Film Deposited by PLA;靶衬间距对激光烧蚀制备纳米Si薄膜特性影响
5.The Preparation of Si Doped ZnO Thin Films and Nano-crystals Si Embedded in Al_2O_3 Films by Magnetron Sputtering磁控溅射法制备Si掺杂ZnO薄膜及Al_2O_3包埋Si纳米晶薄膜
6.Influence of Si-N-O films structure on their hemocompatibilitySi-N-O薄膜结构对薄膜血液相容性的影响
7.Ultra-thin C-N-Si Protective Films Prepared by Plasma Enhanced Deposition;等离子体增强沉积C-N-Si超薄保护膜
8.Study on Zn_2SiO_4/Si Luminescent Thin Film and Device;Zn_2SiO_4/Si发光薄膜与器件研究
9.Stucture and Properties of Zinc Oxide Film on p-Si Substrate;p-Si衬底上生长ZnO薄膜的结构和性能
10.The Fabrication and Properties of Titanium Nitride and Silicon Nitride Films;Ti-N及Si-N薄膜的制备及其性能研究
11.The Properties of Photoluminescence of LiNbO_3/SiO_2/Si Multilayer Films;LiNbO_3/SiO_2/Si多层薄膜光致发光性能研究
12.Studies on Structural Characteristics of ZnO Thin Films Grown on Si(111) Substrate at Various Growth Temperature;生长温度对Si衬底ZnO薄膜结构的影响
13.MOCVD Growth of ZnO Films and ZnO/Si Light-Emitting DevicesZnO薄膜的MOCVD制备及ZnO/Si发光器件研究
14.The Preparation and Luminescent Properties of Si/SiO_2/LiNbO_3(:Fe/Mn) Thin FilmsSi/SiO_2/LiNbO_3(:Fe/Mn)薄膜制备及发光性质研究
15.Fabrication of high-quality ZnO/Si heteroepitaxial films by pulsed laser depositionPLD工艺制备高质量ZnO/Si异质外延薄膜
16.Effect of microstructure on the I-V properties of Si/SiO_2 film薄膜结构对Si/SiO_2 I-V特性的影响
17.Researches on the Si/SiC Nanocomposite Films and Preparation of Si Nanowires by Thermal Evaporation;Si/SiC纳米复合薄膜与热蒸发法制备Si纳米线的研究
18.Growth Behavior of ZnO Film Deposited on Si Substrate by Reactive Magnetron Sputtering;反应磁控溅射ZnO薄膜在Si基片上的生长行为
相关短句/例句
Si/Al/Si filmSi/Al/Si薄膜
3)Si/Fe/Si filmSi/Fe/Si薄膜
1.A sandwich-typeSi/Fe/Si film was deposited on Cu foil by magnetron sputtering.采用磁控溅射法在铜箔集流体上沉积得到了具有“三明治”结构的Si/Fe/Si薄膜。
4)Fe/Si thin filmFe/Si薄膜
5)Ta_2O_5/Si thin filmTa_2O_5/Si薄膜
6)Si/SiO 2 filmsSi/SiO_2薄膜
延伸阅读
Al-Si cast aluminium alloy分子式：CAS号：性质：以硅为主要合金元素的铸造铝合金。硅的添加量范围为5％～25％，并添加镁、铜等元素，形成亚共晶型、共晶型或过共晶型合金。含硅量为5％～13％的亚共晶型或共晶型合金是工业生产中应用最广泛的铸造铝合金。良好的铸造工艺性能和气密性是它们的主要特点。含硅量在13％以上的过共晶型合金具有热膨胀系数小、耐磨性好等特点。
