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电镀抛光液 electropolishing solution英语短句 例句大全

时间:2024-05-15 17:35:29

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电镀抛光液 electropolishing solution英语短句 例句大全

电镀抛光液,electropolishing solution

1)electropolishing solution电镀抛光液

1.Simultaneous determination of sulfamic acid and DL-malic acid in environmental friendlyelectropolishing solution by ion chromatography离子色谱法同时测定环保型电镀抛光液中氨基磺酸和DL-苹果酸

2.In this paper the quantitative method for citric acid inelectropolishing solution by ion chromatography is described.研究用离子色谱法对电镀抛光液中柠檬酸的测定方法,选择合适的分离条件,使电镀抛光液中磷酸、硫酸和柠檬酸得到很好的分离。

英文短句/例句

1.Simultaneous determination of sulfamic acid and DL-malic acid in environmental friendly electropolishing solution by ion chromatography离子色谱法同时测定环保型电镀抛光液中氨基磺酸和DL-苹果酸

2.Electroplate and chemical mechanical polishing technology of ULSIVLSI的电镀和化学机械抛光技术

3.To give a glossy finish to(paper)by pressing between metal sheets or rollers.电镀通过金属板或滚筒之间的挤压给(纸)抛光

4.Automatic Potential Titration Analysis on Bright Acid Electroplating Copper Bath自动电位滴定分析光亮酸性镀铜溶液

5.The Measurement of Content of Cr~(6+) and Cr~(3+) in the Electrochromiuming Solution by Double-Waveleanth Photometric Method;双波长分光光度法测定镀铬电镀液中Cr~(6+)和Cr~(3+)含量

6.Also, the forging and casting products are in our range.表面处理由振动研磨,手工抛光,电解电镀上光,部分电离子分离等技术处于国际领先水平。

7.Influence of electrochemical polishing on hemocompatibility of endovascular stent电化学抛光对血管内支架血液相容性的影响

8.For applications with pitches below 0.5 mm, choices are limited to laser cutting or electroforming.制造过程电抛光和电镀处理的激光刻录的孔壁,改善了锡膏转移的效果。

9.The sixth step is to polish and the last step is gilding.第六步是抛光,最后一步是镀金。

10.double-die-turning finishing hydraulic press双模具翻转抛光液压机

11.electric polisher电热抛光机,烫光机

12.Direct Determination of Hexavalent Chromium in Trivalent Chromium Plating Bath电镀三价铬镀液中Cr~(6+)的直接测定

13.Development of Electrorheological Polishing Device and Path Planning for Electrorheological Polishing;电流变抛光装置开发与抛光轨迹规划

14.Spectrophotometric determination of cobalt in bright nickel plating bath分光光度法测定光亮镀镍溶液中的钴

15.The technological process of acidic bright copper plating has been researched ,provided the process of bright copper plating on the iron without polishing additives.对酸性光亮镀铜进行了研究,不需抛光而可直接在钢铁表面镀出光亮的镀层。

16.The rough chrome plating is for mating to other chrome plated equipment and for additional corrosion resistance.未抛光镀铬表面适合其它镀铬设备,并且具有更强的防腐蚀能力。

17.Study on CMP Nano-Slurry and Technology;CMP纳米抛光液及抛光工艺相关技术研究

18.Chemical mechanical polishing for silicon wafer by composite abrasive slurry利用复合磨粒抛光液的硅片化学机械抛光

相关短句/例句

Eridite["eridait]电镀中间抛光液

3)high-polish coppering bath,high-polish coppering process抛光镀铜法

4)slurry[英]["sl?ri][美]["sl??]抛光液

1.Study on the performances of polishingslurry in chemical mechanical polishing;CMP抛光半导体晶片中抛光液的研究

2.Preparation of ultra-fined Al_2O_3slurry and its polishing properties on disk CMP;超细氧化铝抛光液的制备及其抛光特性研究

3.Tantalum barrier layer of copper interconnection in ULSI and optimization of CMPslurry;ULSI多层铜布线钽阻挡层及其CMP抛光液的优化

5)polishing slurry抛光液

1.According to the analysis of the structure of polishing pad,polishing machine andpolishing slurry,the merits of fixed abrasives (FA)CMP were presented.经过对传统化学机械抛光技术的研究与分析,指出了目前ULSI制造中使用的传统化学机械抛光技术的缺点,通过对固结磨料化学机械抛光中的抛光垫结构、抛光机原理及抛光液的分析,得出了固结磨料化学机械抛光技术的优点,同时还对硅片固结磨料化学机械抛光的缺陷进行了研究。

2.Based on the analysis of mechanism of silicon polishing, this paper discusses the influence ofpolishing slurry on polishing quality.在分析硅衬底的抛光机理的基础上,主要讨论了抛光液对硅衬底抛光质量的影响,同时对抛光液中各成分的选择作了分析研究,采用不含钠离子的有机碱和高效的无钠螯合剂减少了金属离子的玷污,对活性剂影响吸附的作用机理进行了分析,得到了一种小粒径、高速率和低损伤的无钠抛光液。

3.Many factors may affect LiNbO3 CMP,such aspolishing slurry,polishing pad and polishing technological parameters.影响LiNbO3化学机械抛光速率的因素很多,如抛光液组成、抛光垫质量、抛光工艺参数等。

6)polishing solution抛光液

1.Through experiment and analysis, different types of suitablepolishing solutions to improve productivity and the quality of polished surface were proposed.通过实验分析,找到适合不同种类光学玻璃的抛光液类型,以有效提高抛光效率,改善抛光表面质量。

2.Under the same experimental condition(same polishing time,temperature and sapphire concentration),four groups of CdSe wafers were polished using four differentpolishing solutions.采用相同温度、刚玉粉、抛光时间和不同方式配制成抛光液,对4组CdSe晶片进行抛光。

延伸阅读

抛光剂,抛光混合剂CAS:68909-13-7中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate

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