沉积法,deposition
1)deposition[英][,dep?"z??n][美]["d?p?"z???n]沉积法
1.The foamed nickel manufactured by electroless and electro-deposition is introduced.采用化学沉积法和电化学沉积法制备出了泡沫镍。
英文短句/例句
1.HT-CVD(high temperature chemical vapour deposition)高温化学蒸汽沉积法
2.MECHANISM AND KINETICS OF ELECTROPHORETIC DEPOSITION (EPD) OF YTTRIA-STABILIZED ZIRCONIA (YSZ) FILM电泳沉积法制备固体电解质薄膜的沉积速率和沉积机理
3.Preparation of Pulse Electrodeposited Copper and Nickel Nano Multilayer and Primary Exploration of Its Deposition Mechanism铜/镍纳米多层膜脉冲电沉积法制备及沉积机理初探
4.calcium stripping of heavy metals for industrial wastewater以钙沉积法去除工业废水中的重金属
5.Preliminary treatment by sedimentation is practiced.实际上可用沉积法进行初步处理。
6.Studies on the Preparation of Fe-6.5wt%Si Sheet by Molten Salts Electrodeposition;熔盐电沉积法制备Fe-6.5wt%Si薄板研究
7.Preparing Nano-composites by SFD (Supercritical Fluid Deposition) Method;超临界流体沉积法制备纳米复合材料
8.Preparation of SiC Filament by Chemical Vapor Deposition;化学气相沉积法制备钨芯SiC纤维
9.Studies on the Properties of p-CuSCN Thin Films Prepared by Electro- Deposition Method;p-CuSCN薄膜的电沉积法制备与性能研究
10.Fabrication of Superconducting Magnesium Diboride Thin Film by Chemical Vapor Deposition;化学气相沉积法制备MgB_2超导薄膜
11.Research of Electrodeposition Gallium Arsenide Thin Film Material;电共沉积法制备GaAs薄膜材料研究
12.Study on Synthesis of MgB_2 by Electrochemical Deposition Method电化学沉积法制备MgB_2的研究
13.Research on the Preparation of Ultrafine Nickel Powder by Chemical Vapor Deposition化学气相沉积法制备超细镍粉的研究
14.The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
15.The Study of Deposited YBCO Supercnductor Film with PLD;用PLD法沉积YBCO超导薄膜的研究
16.Studies on the Preparation of Si and Fe-6.5wt%Si Sheet by Molten Salts;熔盐法沉积Si及制备Fe-6.5wt%Si薄板研究
17.The Study of the Coating of Silicon Dioxide by CVD Utilizing TEOS-O_3;CVD法采用TEOS-O_3沉积二氧化硅膜
18.Research of Poly-Si Films Deposited by ECR-PECVD at Low-temperature;ECR-PECVD法低温沉积Poly-Si薄膜的研究
相关短句/例句
deposition-precipitation沉积-沉淀法
1.5% Au/Fe2O3 was prepared by co-precipitation,deposition-precipitation and impregnation separately.采用共沉淀法、沉积-沉淀法和浸渍法制备了1。
2.ZrO2 support and Au/ZrO2 catalyst were prepared by aqueous solution precipitation anddeposition-precipitation method, respectively.采用水溶液沉淀和沉积-沉淀法分别制备了ZrO2载体及相应的Au/ZrO2催化剂,通过CO氧化反应考察了载体的制备条件、催化剂的焙烧温度和预处理温度对催化剂活性的影响;通过X射线衍射、氢程序升温还原(H2-TPR)、X射线光电子能谱(XPS)表征,分析了影响催化剂活性的原因。
3.Some oxides(Al2O3,SiO2,TiO2,MgO)and H-ZSM-5 zeolite were used as supports to prepare Au catalysts bydeposition-precipitation(DP)with urea as a precipitator.选择不同氧化物(Al2O3,SiO2,TiO2,MgO)和H-ZSM-5分子筛作为载体,以尿素为沉淀剂,采用沉积-沉淀法制备了一系列负载型金催化剂。
3)deposition-precipitation沉积沉淀法
1.Pd catalysts derived from MgAl hydrotalcite precursors were prepared by three different methods:deposition-precipitation(DP),impregnation(IM),and co-precipitation(CP),which were characterized by ICP,XRD,SEM,TEM,EDS,TPR and surface area measurement.以沉积沉淀法(DP)、浸渍法(IM)和共沉淀法(CP)制备MgAl水滑石衍生氧化物负载钯催化剂,用ICP、XRD、SEM、TEM、EDS、TPR以及比表面测定等手段对催化剂进行了表征。
2.5O 2 (CZ) catalysts were prepared bydeposition-precipitation (DP), mixing (MIX) and conventional impregnation (IMP) methods, and the effects of the preparation methods on the three-way catalytic behaviors were investigated.结果表明沉积沉淀法制备的Pd/Ce0 5Zr0 5O2 催化剂 (Pd DP)表现出最强的Pd 载体作用及最优活性 ,原位红外实验发现Pd DP上存在与传统的浸渍法制备的Pd IMP催化剂不同的NO催化还原途径 ,推测Pd 载体间相互作用引起NO还原机理差异 ,进而导致活性差
4)deposition-precipitation method沉积沉淀法
1.The Au/TiO_2 photocatalyst was prepared by thedeposition-precipitation method and characterized by transmission electron microscopy, diffuse reflectance spectroscopy, and X-ray photoelectron spectroscopy.采用沉积沉淀法制备了Au/TiO2催化剂,用透射电子显微镜、紫外可见漫反射光谱和X射线光电子能谱进行了表征,结果表明,样品在空气中于200℃处理后,金以金属态Au0的形式沉积在TiO2表面。
2.Using ZnCl2,Al2O3 and Na2CO3 as raw materials,ZnO/Al2O3 composite oxide was prepared bydeposition-precipitation method.以ZnCl2、Al2O3和Na2CO3为主要原料,采用沉积沉淀法制得纳米ZnO/Al2O3光催化剂。
3.CuO/ZnO catalysts with different CuO content were prepared bydeposition-precipitation method for water-gas shift reaction,using Cu(OH)2 as the precursor of CuO.首次采用沉积沉淀法,以Cu(OH)2为前驱体制备不同CuO负载质量分数的CuO/ZnO水煤气变换(WGS)催化剂,并运用XRD、N2物理吸附和TPR等方法对催化剂进行结构表征。
5)electrodeposition电沉积法
1.Preparation and characterization of ultrafine cobalt particles byelectrodeposition;电沉积法制备钴超细微粒及其表征
2.Study on the Electrodeposition of CoS Thin Films;电沉积法制备CoS薄膜
3.SnS Thin Films Prepared by Electrodeposition;电沉积法制备SnS薄膜
6)electro-deposition电沉积法
1.lead dioxide electrodes on Ti substrates were produced by thermal-deposition andelectro-deposition.研究了热分解法和电沉积法制备二氧化铅电极的工艺,通过对苯酚的电解和生成羟基自由基的量,比较了两种方法制得的电极的催化性能,并比较了采用电沉积法制备电极时掺杂铋或镧对电极的催化性能的影响。
延伸阅读
电解沉积法生产镉电解沉积法生产镉production of cadmium by electrowinningd一anJ一e ehenjifo shengehon ge电解沉积法生产镐(produetion of cadmiumby eleetrowinning)从含福原料制得的纯净福电解液，经电解沉积生产金属镐的过程，为福生产方法之一。主要用于处理铜福渣，工艺流程如图。主要包括铜福渣硫酸浸出、锌粉置换沉淀海绵福、海绵福溶解造液、福电解沉积和福熔铸等过程。铜锡渣硫酸浸出铜锡渣为湿法炼锌厂的副产物，含福2.5%一12%;此外，还含锌35%一60%、铜4%一17%、铁0.05%~2.0%和少量砷、锑、5102、钻、镍、佗、锢等杂质。在浸出前将其堆放在空气中氧化，可加速浸出过程，但同时也增加了铜的溶解损失，只宜用于处理含铜较低的铜锡渣。铜锡渣的浸出使用硫酸或福电解及锌电解的废液，在机械或空气一机械搅拌槽(见浸出糟)中进行。将硫酸缓慢加入盛有铜福渣的浸出槽中，在保持含游离酸10一159/L的最高浸出酸度和353一363K温度下，浸出6一sh。当酸度降至5一49/L时加入软锰矿，在_二敏化锰铜锅渣硫酸公 福锭 电积法从铜锡渣生产锡工艺流程pHd.8一尔。时加氧化锌粉中和至pHS.2一5.4以除去浸出液中的铜，停止搅拌。浸出的主要反应为: Cd十ZH+一一(:dZ干一衬HZCd()斗一ZH十一一二二CdZ书十HZO Zn十ZH长一~之ZnZ千十H:Cu(〕升一ZH辛=一州二uZ十十H:O Cu洲十Cd一一气!dZ未一粉Cu除锌锅外，镍、钻、锢、铭等杂质也进入溶液。锌粉置换沉派海绵锅净化除杂质后过滤所得的滤液，又重新加硫酸酸化至pH3一4，然后缓慢加入锌粉置换沉淀福，至溶液含锡小于10009/L时进行压滤所得海绵福含福60%~80%。海绵锅溶解造液将海绵福和浓硫酸加入机械搅拌槽中进行溶解造液，在维持358一363K温度下溶解2一3h待溶液酸度降至。，5一19/I，，便加KMnO。氧化除铁。接着用石灰乳中和溶液至pHS.4使部分杂质水解而除去。然后再加入海绵镐使溶液pH降至3·8一4.。，置换除铜后便可送去过滤。所得滤液即为纯净的铜电解液，其主要成分(质量浓度尸/g·l‘)为:(二d Zn Fc(二。;八s斗S十，200一250 20~30长0.05<口.‘)0‘)5<().(jol锅电解沉积与锌电解沉积过程相似以铝板作阴极，用纯铅或铅银合金(含银
