射频辉光放电,Radio frequency glow discharge
1)Radio frequency glow discharge射频辉光放电
1.The deposition of diamond-like carbon films produced by radio frequency glow discharge of hydrocarbon gas was studied,and the effects of radio frequency voltage and deposition time on the thickness and the Vickers microhardness of films were investigated.研究了碳氢气体通过射频辉光放电沉积类金刚石碳膜。
2.Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon(a-Si:H)films.射频辉光放电硅烷等离子体化学汽相沉积是制备氢化非晶硅薄膜的主要工艺技术。
3.This paper reports that a heated and tuned Langmuir probe has been used on the measurement of the electron energy distribution function f(E), the mean electron energy and the electron concentration in radio frequency glow discharge plasma, and gives a systemic analysis about the effect of the technology parameters on the electron character in plasma space.本文采用加热的调谐单探针研究了射频辉光放电等离子体空间电子能量分布函数,电子平均能量和电子密度,并系统地分析了各工艺参量对于等离子体空间电子特性的影响。
英文短句/例句
1.Design and Investigation of Capacitive Coupling Radio Frequency Glow Discharge Source;电容耦合射频辉光放电等离子体激发源研制
2.Two-dimensional PIC/MC Simulation of a Capacitively Coupled RF Glow Discharge in Nitrogen;氮气电容耦合射频辉光放电二维PIC/MC模拟研究
3.Recent Progress of Atmospheric-Pressure Glow Discharges with Bare-Metallic Electrodes裸露金属电极大气压射频辉光放电研究进展
4.The Measurement in SiCl_4/H_2 rf Glow Discharge Using Langmuir Probe;射频辉光放电SiCl_4/H_2等离子体的探针诊断
5.Probe Study of Space Characteristics of Plasma in Radio Frequency Glow Discharge;射频辉光放电等离子体空间特性的探针研究
6.Mass Spectroscopic Diagnosis of Plasma Space Properties in Radio Frequency Glow Discharge;射频辉光放电等离子体空间特性的质谱诊断
7.Studies of P-Si0_2 and P-SiON Films Deposition with TEOS by RF Glow Discharge;TEOS射频辉光放电分解淀积P-SiO_2和P-SiON薄膜的研究
8.Fluid Simulation of Mode Transition Characteristicses of Atmospheric Pressure Radio Frequency Glow Discharge大气压射频辉光放电模式转换机制的流体力学模拟
9.Radiofrequency glow discharge time of flight mass spectrometry for thin films analysis:pulsed mode versus continuous mode射频辉光放电飞行时间质谱法分析薄膜:脉冲模式与连续模式的比较
10.Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征
11.Numerical Simulation of Ar/SiH_4/H_2 RF Glow Discharge at Atmospheric Pressure大气压射频Ar/SiH_4/H_2辉光放电数值模拟
12.Study of PET Fiber Surface Modification by Radio Frequency Atmospheric Pressure Dielectric Barrier Glow Discharge;射频常压介质阻挡辉光放电等离子体表面改性PET纤维的研究
13.Application of Glow Discharge Optical Emission Spectrometer to Material Analysis辉光放电发射光谱法在材料分析中的应用
14.power grid-glow tube强信号栅控辉光放电管
15.hot-cathode grid glow tube热阴极栅控辉光放电管
16.high-voltage glow-discharge ion source高压辉光放电离子源
17.glow discharge lubricant辉光放电合成润滑剂
18.Does the fluorescent lamp discharge in the form of glow or arc日光灯气体放电是辉光放电还是弧光放电
相关短句/例句
RF glow discharge射频辉光放电
1.Optical emissiom spectra of SiH 4 rf glow discharge were measured by OMA-4000.采用OMA - 4 0 0 0测量了SiH4射频辉光放电等离子体的光发射谱 ,研究了其谱线强度随放电射频功率和反应气体流量间的变化关系。
3)RF glow-discharge method射频辉光放电法
1.c-Si∶H/a-Si∶H multilayers have been prepared withRF glow-discharge method in which two types of coupling electrodes are alternately changed periodically.利用射频辉光放电法 ,通过周期性交替切换两种耦合电极的方式 ,制备了 μc- Si∶ H/a- Si∶ H多层膜 。
4)radio frequency glow discharge optical emission spectrometry (rf-GD-OES)射频辉光放电发射光谱法
1.The influence of power (5-18 W) and discharge pressure (5-15 Torr) on emission intensity of element and stability of intensity ratios in middle-low alloy steel using radio frequency glow discharge optical emission spectrometry (rf-GD-OES) were investigated, and the reasons of the influence were analyzed.考察了射频辉光放电发射光谱法中功率(5~18W)和放电气压(5~15Torr)对元素谱线发射强度及相对强度稳定性的影响,并分析了引起影响的原因。
5)High frequency glow discharge高频辉光放电
6)glow discharge sputtering辉光放电溅射
1.The crystal growth byglow discharge sputterings and ion beam sputterings and thecrystal epitaxy are introduced.介绍了气相中晶体生长的方法,如辉光放电溅射法和离子束溅射沉积法以及晶体外延生长的方法。
延伸阅读
辉光放电老化分子式：CAS号：性质：是放电老化的一种，只是放电的方式是辉光放电。塑料或其他高分子材料用于高压绝缘时，因高压的作用会产生辉光或电晕，材料在辉光或电晕作用下同样会发生老化。如用作高压绝缘子的一些塑料制件或有机硅类绝缘子，都要求能有很高的抗辉光或电晕放电的能力。因此进行这样的老化试验，是保证实际使用时的可靠性。
